Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-11-28
2006-11-28
Vinh, Lan (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S248000, C438S706000, C438S719000
Reexamination Certificate
active
07141506
ABSTRACT:
A method for evaluating a plane orientation dependence of a semiconductor substrate comprises: forming a hard mask on a semiconductor substrate having plane orientation (100); anisotropically etching the semiconductor substrate with use of the hard mask as a mask to obtain a surface oriented in a specific crystal orientation; and evaluating a plane orientation dependence of the semiconductor substrate by use of at least a portion of the surface oriented in a specific crystal orientation.
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Endoh Tetsuo
Masuoka Fujio
Takeuchi Noboru
Tanigami Takuji
Yokoyama Takashi
Masuoka Fujio
Nixon & Vanderhye P.C.
Sharp Kabushiki Kaisha
Vinh Lan
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