Etching a substrate: processes – Nongaseous phase etching of substrate
Reexamination Certificate
2006-10-30
2009-08-25
Olsen, Allan (Department: 1792)
Etching a substrate: processes
Nongaseous phase etching of substrate
C252S079300
Reexamination Certificate
active
07578947
ABSTRACT:
An etching composition for non-conductive substrates such as polyester, polyether, polyimide, polyurethane, epoxy resin, polysulfone, polyethersulfone, polyetherimide, and polyamide, comprising a halogenide and/or nitrate of a metal selected from the group consisting of Na, Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Ca, Zn, and combinations thereof such as FeCl3, FeCl2, TiCl3, CaCl2, CuCl2, CrCl3, ZnCl2, MgCl2, MnCl2, and Cr(NO3)3; and a related method for etching.
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Königshofen Andreas
Prinz Ulrich
Schildmann Mark Peter
Enthone Inc.
Olsen Allan
Senniger Powers LLP
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