Method for etching a thin metal layer

Details Method for etching a thin metal layer Method for etching a thin metal layer

2006-10-31

2006-10-31

Chen, Kin-Chan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S750000, C438S754000

Reexamination Certificate

active

07129182

ABSTRACT:
A method for etching a metal layer is described. That method comprises forming a metal layer on a substrate, then exposing part of the metal layer to a wet etch chemistry that comprises an active ingredient with a diameter that exceeds the thickness of the metal layer.

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