Method for etching

Details Method for etching Method for etching

2006-10-03

2006-10-03

Ahmed, Shamim (Department: 1765)

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching inorganic substrate

C216S041000, C216S108000, C252S079100

Reexamination Certificate

active

07115212

ABSTRACT:
A method of etching a metal oxide film includes depositing a metal (M) on the metal oxide film and contacting the metal oxide film and the metal (M) with an etch liquid comprising an acid (A) and a metal dissolution agent (X). The method can avoid patchwise etch.

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