Method for establishing an electrical field at a surface of a se

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device

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257655, 377 57, 377 60, 377 63, H01L 2978, H01L 2906

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active

053629787

ABSTRACT:
A thinned backside illuminated charge-coupled imaging device has improved quantum efficiency by providing a sharp ion implant distribution profile (20) disposed at the rear surface (22) of the device. The sharp ion implant distribution profile (20) is formed using ion implantation at a beam energy potential of between 100-150 keV, which forms an electric field beneath the surface of the device. The ion distribution profile (20) is brought to the surface (22) of the device by removing silicon (18) from the rear surface (22), using a polishing technique wherein the device is lapped with colloidal silica abrasive to controllably remove silicon down to the level of the ion implantation profile (20).

REFERENCES:
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patent: 4656519 (1987-04-01), Savoye
patent: 4679212 (1987-07-01), Hynecek
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patent: 4774557 (1988-09-01), Kosonocky
patent: 4875084 (1989-10-01), Tohyama
patent: 4963952 (1990-10-01), Janesick
patent: 4994875 (1991-02-01), Hynecek
patent: 5005063 (1991-04-01), Janesick
patent: 5134274 (1992-07-01), Poole et al.
Janesick et al. "Flash Technology For CCD Imaging in the UV," SPIE, vol. 687, 1987, pp. 36-55.

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