Data processing: measuring – calibrating – or testing – Measurement system – Statistical measurement
Reexamination Certificate
2007-09-20
2009-10-27
Cosimano, Edward R (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system
Statistical measurement
C702S180000
Reexamination Certificate
active
07610170
ABSTRACT:
A method for improving the measurement capability of multi-parameter inspection systems includes performing a measuring procedure to acquire a measured signature of a sample, calculating weighting factors representing a correlation between structural parameters of the sample by using a weighting algorithm, transforming the weighting factors into a sampling function by using a transforming rule, updating the measured signature to form an updated measured signature and generating a plurality of updated nominal signatures according to the sampling function, and comparing the updated measured signature and the updated nominal signatures to determine the structural parameters of the sample.
REFERENCES:
patent: 6900892 (2005-05-01), Shchegrov et al.
patent: 7099005 (2006-08-01), Fabrikant et al.
“Formulation for Stable and Efficient Implementation of the Rigorous Coupled-Wave Analysis of Binary Gratings”; Moharam, MG; Grann,EB; Pommet, DA; Journal of the Optical Society of America; vol. 12, issue 5; May 1995; pp. 1068-1076.
Thomas Hingst et al.,; Spectroscopic ellipsometry-based scatterometry for depth and line width measurements of plysilicon-filled deep trenches; Journal; 2004; pp. 587-596; vol. 5375; Metrology, Inspection, and Process Control for Microlithography XVIII; Proceedings of SPIE.
Vladimir A. Ukraintsev et al.,; A Comprehensive Test of Optical Scatterometry Readiness for 65 nm Technology Production; Jouranl; 2006; pp. 1-13; vol. 6152; Metrology, Inspection, and Process Control for Microlithography XX; Proceedings of SPIE.
Chang Chung Chu
Ko Chun Hung
Kuo Yi Sha
Cosimano Edward R
Industrial Technology Research Institute
King Anthony
Washburn Douglas N
WPAT, P.C.
LandOfFree
Method for enhancing the measurement capability of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for enhancing the measurement capability of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for enhancing the measurement capability of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4079201