Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2011-07-19
2011-07-19
Picardat, Kevin M (Department: 2822)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S022000, C438S029000, C438S032000, C438S045000, C438S520000, C438S528000
Reexamination Certificate
active
07981707
ABSTRACT:
The method of the invention consists of implanting ions into the surface of multilayer optical waveguides, in the highly doped layer, in a defined pattern so as to modify the refractive index of this layer.
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De Rossi Alfredo
Page Hideaki
Sirtori Carlo
Au Bac H
Lowe Hauptman & Ham & Berner, LLP
Picardat Kevin M
Thales
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