Method for energy control of pulsed driven, gas...

Coherent light generators – Particular active media – Gas

Reexamination Certificate

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C372S055000

Reexamination Certificate

active

06865212

ABSTRACT:
The invention is directed to a method for energy regulation of pulsed-operation gas discharge-coupled radiation sources, particularly of excimer lasers, F2lasers and EUV radiation sources. The object of the invention is to find a novel possibility for energy regulation of pulsed-operation gas discharge-coupled radiation sources which permits a control of the charging voltage while taking into account the aging of gas discharge components (particularly of the work gas) without recalibration of the system. This object is met in that the pulse energy is measured for each individual pulse, at least the charging voltage is detected as influencing variable on the pulse energy for each individual pulse, the error of the current pulse energy is determined for that pulse in relation to a predetermined target value of the pulse energy, the set energy ES, the mean square deviation from the set energy is calculated by time-average over a large quantity of pulses, and the pulse energy is controlled for every pulse by a proportional regulation of the charging voltage, wherein the proportional regulation is carried out with an adapted regulating factor which is determined by minimizing the mean square deviation of the current pulse energy.

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Proceedings of SPIE vol. 3997 (2000) 126-135, t V. Banine et al. “The Relationship Between an EUV Source and the Performance of am EUV Lithographic System”.

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