Method for eliminating process byproduct during fabrication...

Details Method for eliminating process byproduct during fabrication... Method for eliminating process byproduct during fabrication...

2005-05-10

2005-05-10

Nguyen, Thanh (Department: 2813)

Semiconductor device manufacturing: process

Chemical etching

C438S706000, C438S711000, C438S715000

Reexamination Certificate

active

06890856

ABSTRACT:
A fabricating method of a liquid crystal display includes the steps of inserting a first substrate into a chamber to perform a dry etching process, removing the first substrate from the chamber after completion of the dry etching process, inserting a dummy substrate into the chamber, injecting inert gas into the chamber to eliminate a process byproduct and a remaining gas, taking the dummy substrate out from the chamber, and inserting a second substrate into the chamber having the process byproduct and the remaining gas removed, to perform an ashing process.

REFERENCES:
patent: 20040137741 (2004-07-01), Chebi et al.

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