Method for eliminating metal halides that are present in a...

Details Method for eliminating metal halides that are present in a... Method for eliminating metal halides that are present in a...

2007-08-07

2007-08-07

Savage, Matthew O. (Department: 1724)

Liquid purification or separation

Processes

Ion exchange or selective sorption

C210S688000, C210S912000, C095S131000, C095S133000

Reexamination Certificate

active

10473987

ABSTRACT:
The invention relates to a method for eliminating metal halides which are present in a liquid or gaseous, organic or non-organic effluent. According to the invention, the elimination is carried out by absorption of said metal halides on alumina agglomerates. The inventive method is characterised in that: the specific surface area of said agglomerates is between 50 and 350 m2/g, preferably between 70 and 300 m2/g and, better still, between 80 and 250 m2/g; and the V80Åthereof is greater than or equal to 20 ml/100 g, preferably greater than or equal to 25 ml/100 g, better still greater than or equal to 30 ml/100 g and, optimally, greater than or equal to 35 ml/100 g.

REFERENCES:
patent: 3691239 (1972-09-01), Hackett et al.
patent: 4053558 (1977-10-01), Campbell
patent: 4444899 (1984-04-01), Yamada et al.
patent: 5288849 (1994-02-01), Garcin et al.
patent: 5316998 (1994-05-01), Lee et al.
patent: 2 774 606 (1999-08-01), None
patent: 1 223 238 (1971-02-01), None
patent: 1380497 (1975-01-01), None
patent: 2000203829 (2000-07-01), None
International Search Report PCT/FR02/01070—Dated Jun. 14, 2002—H. Bertram Authorized Officer—3 Pages.

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