Method for electroplating of tantalum

Details Method for electroplating of tantalum Method for electroplating of tantalum

2005-08-30

2005-08-30

King, Roy (Department: 1742)

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Utilizing fused bath

Reexamination Certificate

active

06936155

ABSTRACT:
The present invention provides a method of electrolytically forming a tantalum film by using a molten-salt electrolytic bath having a low temperature. The electrolytic bath includes a molten salt containing tantalum pentachloride, alkylimidazolium chloride, and an alkali metal or alkali earth metal fluoride such as lithium fluoride.

REFERENCES:
patent: 3444058 (1969-05-01), Senderoff et al.
Patent Abstracts of Japan, Publication No. 07-118888, dated May 9, 1995.
Patent Abstracts of Japan, Publication No. 06-057479, dated Mar. 1, 1994.
F. Lantelme et al.; Electrodeposition of Tantalum in NaCl-KCl-K2TaF7Melts, J. Electrochem Soc., vol. 139, No. 5, pp. 1249-1255, May 1992.
Morio Matsunaga et al.; Proceedings of the seventh China-Japan Bilateral Conference on Molten Salt Chemistry and Technology, pp. 209-213, Oct. 26-30, 1998, Xian, China.
M. Morimitsu et al.; Electrochemical Behaviors of TaCl5-EMIC Molten Salts, The Electrochemical Society of Japan, p. 233, 1998.
T. Matsuo et al; Electrochemical Reduction of Ta(V) in TaCl5-EMIC Low Temperature Molten Salts (II), The 31st. Symposium on Molten Salt Chemistry, pp. 35-52.

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