Method for electroplating a substrate containing an electroplate

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Uniting two separate solid materials

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

205125, 205126, 205136, C25D 502

Patent

active

056814410

ABSTRACT:
A method for the electroplating of conductive metal onto a substrate containing at least one hole and an electroplateable surface which is conducive to subsequent metal deposition comprises placing the substrate in close proximity to an electrode but such that there is no substantial electrical continuity between the electroplateable surface and the electrode prior to electroplating. The electroplateable surface is preferably an electroplateable pattern which comprises either a conductive metal pattern or a catalytic pattern for subsequent plating. This process can be employed with any electroplateable pattern technique which is recognized in the art such as, for example, printing, stamping, plating, photographic or electrophotographic processes. In one embodiment, this process can be employed in the production of Plated Wire, i.e., a product which can be effectively employed as a replacement for drawn wires in power distribution applications.

REFERENCES:
patent: 2600343 (1952-06-01), Tuttle
patent: 3053929 (1962-09-01), Friedman
patent: 3080270 (1963-03-01), Lorenz
patent: 3099608 (1963-07-01), Radovsky et al.
patent: 3167450 (1965-01-01), Friedman
patent: 3167490 (1965-01-01), Friedman
patent: 3194681 (1965-07-01), Nicholson
patent: 3347724 (1967-10-01), Schneble, Jr. et al.
patent: 3385773 (1968-05-01), Frantzen
patent: 3523875 (1970-08-01), Minklei
patent: 3582479 (1971-06-01), Urban et al.
patent: 3625758 (1971-12-01), Krefeld et al.
patent: 3634205 (1972-01-01), Melillo et al.
patent: 3769179 (1973-10-01), Durose et al.
patent: 3812020 (1974-05-01), Vander Mey
patent: 3854973 (1974-12-01), Mersereau et al.
patent: 3880689 (1975-04-01), Rolker et al.
patent: 3954570 (1976-05-01), Shirk et al.
patent: 3988216 (1976-10-01), Austin et al.
patent: 4131516 (1978-12-01), Bakos et al.
patent: 4169770 (1979-10-01), Cooke et al.
patent: 4217182 (1980-08-01), Cross
patent: 4368281 (1983-01-01), Brummett et al.
patent: 4518465 (1985-05-01), Morimoto
patent: 4548682 (1985-10-01), Yoshida
patent: 4681665 (1987-07-01), Guillermet et al.
patent: 4683036 (1987-07-01), Morrisey et al.
patent: 4790912 (1988-12-01), Holtzman et al.
patent: 4808273 (1989-02-01), Hua et al.
patent: 4810333 (1989-03-01), Gulla et al.
patent: 4876177 (1989-10-01), Akahoshi et al.
patent: 4900618 (1990-02-01), O'Connor et al.
patent: 4915796 (1990-04-01), Denofrio
patent: 4919768 (1990-04-01), Bladon
patent: 4933010 (1990-06-01), Okabayashi
patent: 4964947 (1990-10-01), Yarita et al.
patent: 5007990 (1991-04-01), Bladon
patent: 5013402 (1991-05-01), Yarita et al.
patent: 5020219 (1991-06-01), Leedy
patent: 5071517 (1991-12-01), Oabayashi
patent: 5082734 (1992-01-01), Vaughn
patent: 5092958 (1992-03-01), Yarita et al.
patent: 5092967 (1992-03-01), Guess
"Thin Film Electroplated Funnel Through-Holes on Polyamide Resin and Laminated Boards" by R.E. Hicks in Solid State Technology, vol. 16, No. 7, Jul. 1973, pp. 36-40.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for electroplating a substrate containing an electroplate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for electroplating a substrate containing an electroplate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for electroplating a substrate containing an electroplate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1023496

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.