Method for electron beam deposition of multicomponent evaporants

Details Method for electron beam deposition of multicomponent evaporants Method for electron beam deposition of multicomponent evaporants

1996-04-29

1998-05-12

Padgett, Marianne

Coating processes

Measuring, testing, or indicating

427 10, 427566, B05D 306

Patent

active

057501858

ABSTRACT:
A method for the electron beam deposition of a multicomponent evaporant to ensure a consistent layer quality with constant composition and thickness in a defined manner. The X-radiation emitted from the evaporant on the point of electron beam impingement is measured in situ, using the obtained signal as reference input to control the parameters of the evaporation process and therefore to control the deposition rate and material composition of the deposited layer. The method is used for the production of corrosion resistant, high-temperature resistant, hard-wearing or optical layers on, for example, strip steel or plastic film.

REFERENCES:
patent: 3612859 (1971-10-01), Schumacher
patent: 3854984 (1974-12-01), Schadler et al.
patent: 4166784 (1979-09-01), Chapin et al.
patent: 4262160 (1981-04-01), McKoon et al.
patent: 4988844 (1991-01-01), Dietrich et al.
patent: 5051599 (1991-09-01), Benes et al.
"Sentinel III: Alloy Deposition Controller" published by Leybold Heraeus H, Hanau Works No Date.
L.V. Berzins "Composition Monitoring of Electron Beam Melting Processes Using Diode Lasers" in Electron Beam Melting and Refining--State of the Art 1991, Proc. of the Conf., Reno 1991 (no month given, but must be after May).

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