Chemistry: electrical and wave energy – Processes and products
Patent
1974-10-29
1976-04-13
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
204DIG9, 340174TF, 360131, C25D 356, G11C 1102
Patent
active
039502341
ABSTRACT:
An electrolytic plating solution and method for depositing ferromagnetic recording films therefrom is described. The plating solution has cobaltous ion in the range of from about 3 to 15 grams per liter, nickelous ion in the range of from about 30 to 50 grams per liter, and orthophosphite ion in the range of from about 3 to 12 grams per liter. It is important that the ratio of nickelous ions to cobaltous ions be in the range of from about 3:1 to about 15:1. The plating solution is substantially free of hypophosphite ion, phosphate ion, copper and iron so that phosphite ion is the sole source of phosphorus. Optionally the solution may contain up to about 30 grams per liter of boric acid and up to about 25 grams per liter of formate ion. The pH of the solution is maintained in the range of from about 3.5 to 4.7. Plating is conducted with either direct current or pulsed direct current at a current density in the range of from about 10 to 120 amperes per square foot and at a temperature in the range of from about 70 to 140.degree.F. Coercivity and retentivity of the electrodeposited coating can be independently controlled over a very wide range of values by control of the several variables of composition, temperature, pH, etc. in a complex multivariant system. The hysteresis loop has a high degree of "rectangularity."
REFERENCES:
patent: 3152974 (1964-10-01), Zentner
patent: 3637471 (1972-01-01), Faulkner
V. M. Zhogina et al., Soveschania po Elecktrokhimii, Vol. 3, pp. 40-44 (1961).
M. A. Sanborn et al., IBM Tech. Disclosure Bulletin, Vol. 6, No. 6, p. 4, Nov. 1963.
Faulkner John P.
Morton Dennis S.
Burroughs Corporation
Kaplan G. L.
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