Method for electrochemical mechanical polishing

Details Method for electrochemical mechanical polishing Method for electrochemical mechanical polishing

2009-09-14

2010-10-05

King, Roy (Department: 1793)

Electrolysis: processes, compositions used therein, and methods

Electrolytic erosion of a workpiece for shape or surface...

With mechanical abrasion or grinding

C205S662000

Reexamination Certificate

active

07807038

ABSTRACT:
The present invention provides a method of electrochemical polishing of a workpiece using a polishing pad having a cellular polymeric layer overlying a conductive substrate, the cellular polymeric layer having a thickness less than 1.5 mm; wherein the cellular polymeric layer comprises a plurality of pores that extend through the thickness of the cellular polymeric layer from a polishing surface of the cellular polymeric layer to the conductive substrate; and wherein the plurality of pores exhibit a diameter that is smaller at the polishing surface than at the conductive substrate.

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patent: 2004/0082289 (2004-04-01), Butterfield

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