Coating processes – Measuring – testing – or indicating
Reexamination Certificate
2008-05-12
2010-02-16
Ahmed, Shamim (Department: 1792)
Coating processes
Measuring, testing, or indicating
C427S058000, C427S421100, C427S427100, C427S162000, C427S256000, C347S008000, C347S014000, C347S016000
Reexamination Certificate
active
07662423
ABSTRACT:
A method for ejecting a liquid material includes classifying the plurality of nozzles of a head into a plurality of nozzle groups having different landing position accuracies for droplets; and performing ejection includes main scanning for ejecting droplets of the liquid material through selected nozzles while generating relative movement in a main-scanning direction between the head and a target substrate, and sub-scanning for generating relative movement between the head and the target substrate in a sub-scanning direction orthogonal to the main-scanning direction. The main scanning and the sub-scanning are performed separately for each of the plurality of nozzle groups. During the sub-scanning, relative movement is generated in accordance with correction information for the corresponding nozzle group for correcting landing positions of the droplet. During the main scanning, a droplet is ejected through at least one nozzle selected from the corresponding nozzle group.
REFERENCES:
patent: 2004/0023567 (2004-02-01), Koyama et al.
patent: 2004/0104951 (2004-06-01), Shibata et al.
patent: A-2003-121631 (2003-04-01), None
patent: A-2004-058282 (2004-02-01), None
patent: A-2006-044059 (2006-02-01), None
Ahmed Shamim
Oliff & Berridg,e PLC
Seiko Epson Corporation
LandOfFree
Method for ejecting liquid material, method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for ejecting liquid material, method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for ejecting liquid material, method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4216651