Method for dynamically monitoring a reticle

Details Method for dynamically monitoring a reticle Method for dynamically monitoring a reticle

2007-12-04

2007-12-04

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

With plural diverse test or art

C356S239100, C356S237400, C356S237500, C716S030000

Reexamination Certificate

active

10984797

ABSTRACT:
The method of dynamically monitoring a reticle includes preventively macro monitoring and defect inspecting with regard to mechanical loading, including particle deposits or electrostatically induced damage, and energy load, including the associated changes to the reticle material and surface characteristics. Different surface distributions of the absorber layer as well as characteristics of the exposure system, such as N2purging of the projection lens/reticle area in order to reduce contamination and recrystallization on optically active surfaces are considered.

REFERENCES:
patent: 5323440 (1994-06-01), Hara et al.
patent: 6433351 (2002-08-01), Yonekawa
patent: 6703170 (2004-03-01), Pindo
Grenville, A. et al., “Behavior of Candidate Organic Pellicle Materials Under 157nm Laser Irradiation,” 10 pages.
Bhattacharyya, K. et al., “The Case of the “Growing” Reticle Defect at 193-nm Lithogrphy,” Yield Management Solutions, Summer 2003, pp. 78-84.

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