Method for dust-proofing in the manufacture of electronic device

Details Method for dust-proofing in the manufacture of electronic device Method for dust-proofing in the manufacture of electronic device

1992-01-06

1993-10-19

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

525 61, G03F 900

Patent

active

052544192

ABSTRACT:
Disclosed is a method for dust-proofing of a photomask in the photolithographic processing of electronic devices, e.g., LSIs and liquid-crystal display panels, in which the photomask is covered with a pellicle having a frame-supported light-transmitting membrane made from a polyvinyl alcohol modified by silylating the hydroxy groups of the polyvinyl alcohol with triorganosilyl groups of the formula R.sub.3 Si--, in which R is a monovalent hydrocarbon group, e.g., alkyl, in a degree of substitution of at least 40%. The membrane of the pellicle is highly transparent to light of short wavelength in the ultraviolet region and excellently durable under prolonged irradiation with ultraviolet light not to cause yellowing or mechanical breaking.

REFERENCES:
patent: 5036137 (1991-07-01), Sau

Affiliated with

Also associated with

Rating

Method for dust-proofing in the manufacture of electronic device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for dust-proofing in the manufacture of electronic device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for dust-proofing in the manufacture of electronic device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1350529