Method for drying semiconductor substrates

Details Method for drying semiconductor substrates Method for drying semiconductor substrates

1980-12-22

1983-11-01

Schwartz, Larry I.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

118620, 34239, 219 1055R, F26B 334

Patent

active

044123884

ABSTRACT:
A method for drying semiconductor substrates wherein a plurality of semiconductor substrates are irradiated with electromagnetic waves emitted from a waveguide in a non-reactive atmosphere of normal atmospheric pressure while the semiconductor substrates are positioned so that the predominant faces thereof substantially form right angles to the face of an opening of the waveguide.

REFERENCES:
patent: 4201579 (1980-05-01), Robinson et al.
patent: 4243744 (1981-01-01), Lockwood et al.
patent: 4276462 (1981-06-01), Risman
patent: 4281031 (1981-07-01), Hillman et al.
patent: 4286136 (1981-08-01), Mason, Jr.

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