Method for dry cleaning clean room containers

Details Method for dry cleaning clean room containers Method for dry cleaning clean room containers

1996-01-11

1998-12-08

Warden, Jill

Measuring and testing

134 8, 134 221, 134 2218, 134 21, 134 26, 134 30, 134 37, 451 38, 451 39, 451 40, B08B 300

Patent

active

058463380

ABSTRACT:
A method and apparatus for dry cleaning a semiconductor wafer storage and transport pod. After the pod is located with respect to the cleaning chamber and opened to expose the interior surfaces of the pod to the cleaning chamber, the pod is conditioned in preparation for the cleaning process. The conditioning of the pod includes purging the pod and cleaning chamber with an ionized nitrogen gas to rid the pod and cleaning chamber of airborne contaminants and to neutralize static electrical charges on the pod surfaces. The conditioning process further includes heating the pod surfaces to prevent condensation of moisture and organic contaminants thereon. After the conditioning process, the pod is cleaned with a dry aerosol sprayed onto the pod surfaces. The aerosol spray is comprised of an ionized carbon dioxide
itrogen (CO.sub.2 /N.sub.2) gas and fine particles of CO.sub.2. The dry cleaning apparatus further includes a circulation subsystem for circulating a fluid through the pod and cleaning chamber to remove airborne particulate, such as those dislodged from the pod surfaces by the CO.sub.2 /N.sub.2 aerosol spray. A filter provided within the path of the circulating fluid removes particulates from the circulating fluid.

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