Method for drawing a pattern by charged beam and its apparatus

Details Method for drawing a pattern by charged beam and its apparatus Method for drawing a pattern by charged beam and its apparatus

1986-12-19

1988-03-01

Church, Craig E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

364490, H01J 37304, H01J 37302

Patent

active

047287977

ABSTRACT:
The data in a counter in which a tolerable displacement of a table during the drawing in a sub-field and a movement of the table are compared in comparator. When the table movement exceeds a predetermined tolerable displacement preset in circuit for table movement correction, a signal for interrupting the pattern drawing is transferred to a control section. The main deflection position and the correction data for minor deflection distortion are set anew by a computer. Then, drawing of the remaining patterns is restarted.

REFERENCES:
patent: 4586141 (1986-04-01), Yasuda et al.
Weber et al., J. Vac. Sci. Technol., 16(6), Nov./Dec., 1979, pp. 1780-1782.
J. Vac. Sci. Technol., B3(1)1-476, Jan./Feb. 1985, pp. 106-111, H. J. King et al.

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