Wells – Processes – Separating material entering well
Patent
1997-04-21
1999-06-22
Suchfield, George
Wells
Processes
Separating material entering well
166369, 166373, 405128, E21B 4338
Patent
active
059133635
ABSTRACT:
A method for downhole separation of natural gas from brine with injection of spent brine into a disposal formation. Firstly, select a free flowing gas well having a suitable disposal formation. Secondly, separate the gas well into a disposal zone, a production zone and a separation zone. The disposal zone has a pressure sensitive valve set to open within a preset threshold pressure range. The separation zone is in fluid communication with the pressure sensitive valve. Thirdly, position a gas/water separator in the separation zone. Fluids flowing up a production conduit pass through the gas/water separator thereby separating the gas from the brine. The spent brine accumulates in the separation zone with the pressure sensitive valve intermittently opening to inject spent brine into the disposal zone when the weight of the accumulated column of spent brine reaches the threshold pressure range.
REFERENCES:
patent: 3333638 (1967-08-01), Bishop
patent: 4377208 (1983-03-01), Elliott et al.
patent: 4429740 (1984-02-01), Malinchak
patent: 4766957 (1988-08-01), McIntyre
patent: 4793408 (1988-12-01), Miffre
patent: 5335732 (1994-08-01), McIntyre
patent: 5366011 (1994-11-01), Jennings, Jr.
patent: 5403476 (1995-04-01), Bernhardt
patent: 5443120 (1995-08-01), Howell
patent: 5605193 (1997-02-01), Bearden et al.
George Neis, Dennis Sabasch & Ernie Chissel
Suchfield George
LandOfFree
Method for downhole separation of natural gas from brine with in does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for downhole separation of natural gas from brine with in, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for downhole separation of natural gas from brine with in will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1701820