Method for double-dip substrate spin optimization of coated...

Coating processes – Centrifugal force utilized

Reexamination Certificate

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C427S346000, C427S421100, C427S430100, C118S052000, C118S056000, C118S300000, C118S400000

Reexamination Certificate

active

08080279

ABSTRACT:
The present invention discloses a method for preparing a substrate coated support for use in micro-array devices. The method of the present invention comprises the steps of applying a first coat of substrate to a support, making the substrate coating ramp by subjecting the coated support to centripetal forces, adding a second coat of substrate to the resulting support having a ramping planar coat and subjecting the coated support to centripetal forces for a second time to produce a substrate coated membrane in which the thickness of the substrate layer is uniform across the entire coated surface.

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