Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Radioactive metal
Patent
1977-06-01
1979-01-16
Miller, Edward A.
Chemistry of inorganic compounds
Treating mixture to obtain metal containing compound
Radioactive metal
2523011R, 423 20, 423251, C01G 5600
Patent
active
041349601
ABSTRACT:
PuO.sub.2 -containing solids, particularly residues from incomplete HNO.sub.3 dissolution of irradiated nuclear fuels, are dissolved in aqueous HI. The resulting solution is evaporated to dryness and the solids are dissolved in HNO.sub.3 for further chemical reprocessing. Alternatively, the HI solution containing dissolved Pu values, can be contacted with a cation exchange resin causing the Pu values to load the resin. The Pu values are selectively eluted from the resin with more concentrated HI.
REFERENCES:
patent: 2813064 (1957-11-01), Wahl
patent: 2926068 (1960-02-01), Davidson et al.
patent: 2942939 (1960-06-01), Beaton
patent: 3434809 (1969-03-01), Swanson
patent: 4025602 (1977-05-01), Campbell et al.
patent: 4069293 (1978-01-01), Tallent
Holley et al., "Proc. Second U.N. Intl. Conf. Peaceful Uses of Atomic Energy", vol. 6, p. 216, United Nations, Geneva (1958).
Cleveland I, "The Chemistry of Plutonium", pp. 142-148, 301-302, 574-575, Gordon and Breach Science Publishers, (1970), New York.
Cleveland II, "J. Inorg. Nucl. Chem.", 26, 1470-1471, (1964).
Mailen James C.
Tallent Othar K.
Vondra Benedict L.
Carlson Dean E.
Hamel Stephen D.
Miller Edward A.
The United States of America as represented by the United States
Uzzell Allen H.
LandOfFree
Method for dissolving plutonium oxide with HI and separating plu does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for dissolving plutonium oxide with HI and separating plu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for dissolving plutonium oxide with HI and separating plu will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-651811