Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1994-11-14
1996-07-09
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427270, 427272, 427282, 427377, 427380, 4273831, 427404, 4274193, 427552, 427558, 427581, 427597, H05H 100
Patent
active
055343120
ABSTRACT:
A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying an amorphous film of a metal complex to a substrate. The film may be conveniently applied by spin coating using standard industry techniques. The metal complex used is photoreactive and undergoes a low temperature chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres. The resulting patterned film is generally planar. Separate planarization steps are not generally required.
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Avey, Jr. Alfred A.
Blair Sharon L.
Chu Chu-Hui W.
Gao Meihua
Hill Ross H.
Pianalto Bernard
Simon Fraser University
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