Method for developing electron beam sensitive resist films

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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96 35, 96 36, 96 49, 96 91D, 427335, 156 13, 156 17, B05D 306, G03F 102

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active

039611000

ABSTRACT:
The effective sensitivity of a photo- or electron beam resist is improved by contacting the resist film with developer solution and water prior to exposure.

REFERENCES:
patent: 2911299 (1959-11-01), Baril et al.
patent: 3264104 (1966-08-01), Reichel
patent: 3639185 (1972-02-01), Colom
patent: 3649393 (1972-03-01), Hatzakis
patent: 3707373 (1972-12-01), Martinson et al.
patent: 3779774 (1973-12-01), Cope et al.
patent: 3841874 (1974-10-01), Nishino
patent: 3850633 (1974-12-01), Ross et al.
patent: 3850733 (1974-11-01), Morau et al.
Cortellino et al., "IBM Technical Disclosure Bulletin," vol. 15, No. 1, 6/1972, p. 174.

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