Method for developing electron beam sensitive resist films

Details Method for developing electron beam sensitive resist films Method for developing electron beam sensitive resist films

1974-09-16

1976-06-01

Bowers, Jr., Charles L.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 35, 96 36, 96 49, 96 91D, 427335, 156 13, 156 17, B05D 306, G03F 102

Patent

active

039611000

ABSTRACT:
The effective sensitivity of a photo- or electron beam resist is improved by contacting the resist film with developer solution and water prior to exposure.

REFERENCES:
patent: 2911299 (1959-11-01), Baril et al.
patent: 3264104 (1966-08-01), Reichel
patent: 3639185 (1972-02-01), Colom
patent: 3649393 (1972-03-01), Hatzakis
patent: 3707373 (1972-12-01), Martinson et al.
patent: 3779774 (1973-12-01), Cope et al.
patent: 3841874 (1974-10-01), Nishino
patent: 3850633 (1974-12-01), Ross et al.
patent: 3850733 (1974-11-01), Morau et al.
Cortellino et al., "IBM Technical Disclosure Bulletin," vol. 15, No. 1, 6/1972, p. 174.

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