Method for detoxifying HCD gas and apparatus therefor

Details Method for detoxifying HCD gas and apparatus therefor Method for detoxifying HCD gas and apparatus therefor

2011-07-12

2011-07-12

Nguyen, Ngoc-Yen M (Department: 1734)

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Halogenous component

C423S481000, C423S488000, C423S335000, C423S336000, C423S337000

Reexamination Certificate

active

07976807

ABSTRACT:
Hexachlorodisilane is decomposed into hydrochloric acid, silicon dioxide and water by introducing hexachlorodisilane-containing flue gas into a reaction region without moistening the flue gas and by supplying oxygen-containing gas that also contains a small amount of moisture to the reaction region maintained at a temperature at which hexachlorodisilane decomposes.

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