Method for determining thickness of chemical vapor deposited lay

Details Method for determining thickness of chemical vapor deposited lay Method for determining thickness of chemical vapor deposited lay

1993-11-17

1994-12-13

Bueker, Richard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Condition of coated material

118708, 118712, 118715, 427 9, 427 10, 427237, C23C 1600

Patent

active

053726456

ABSTRACT:
The thickness of a layer of material deposited by chemical vapor deposition, especially a diamond layer, is monitored by providing at least one substrate on which the material is deposited, with at least one perforation of a predetermined size therein. The relationship between the thickness of the layer formed in said perforation and the thickness of the layer formed on the substrate surface is determined, so that the thickness of the surface layer can be determined from the thickness of the layer formed in the perforation.

REFERENCES:
patent: 2726173 (1955-12-01), Martin
patent: 4427711 (1984-01-01), Martin
patent: 4466872 (1984-08-01), Einbinder
patent: 5061513 (1991-10-01), Flynn
patent: 5131752 (1992-07-01), Yu et al.
patent: 5204144 (1993-04-01), Cann et al.

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