Optics: measuring and testing – By particle light scattering – With photocell detection
Patent
1983-06-30
1985-07-02
Arnold, Bruce Y.
Optics: measuring and testing
By particle light scattering
With photocell detection
356237, G01N 2101
Patent
active
045264686
ABSTRACT:
A method of determining the crystalline or structural quality of phase transformable material such as silicon uses light scattering. The material is exposed to a beam of light of a selected wavelength. Scattered light having an intensity above a threshold is detected to provide a signal which is used to control the intensity of a display beam of a visual display device. The threshold is varied to thereby vary the display beam intensity so as to provide the minimum intensity of display beam which yields a full display. The value of the thusly adjusted threshold intensity is used as a direct measure of the structural quality of the material.
The light scattering process is used to determine the phase of deposited material.
A layer of silicon material annealed from as-deposited amorphous phase material is easily and quickly distinguished from material as-deposited crystalline phase material and subsequently annealed.
REFERENCES:
patent: 4314763 (1982-02-01), Steigmeier et al.
patent: 4352016 (1982-09-01), Duffy et al.
patent: 4352017 (1982-09-01), Duffy et al.
patent: 4391524 (1983-07-01), Steigmeier et al.
"Light Scattering with Laser Sources," RCA Engineer, 15, 82(1970)--Dr. G. Harbeke/Dr. E. F. Steigmeier, (pp. 82-85).
Auderset Heinrich
Steigmeier Edgar F.
Arnold Bruce Y.
Cohen Donald S.
Lazar Joseph D.
Morris Birgit E.
RCA Corporation
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