Method for determining the cleanliness of a surface

Details Method for determining the cleanliness of a surface Method for determining the cleanliness of a surface

1996-04-04

1998-05-26

Raevis, Robert

Measuring and testing

Surface and cutting edge testing

G01N 1302

Patent

active

057568855

ABSTRACT:
A method for determining the cleanliness of a surface of a substrate involves using a visual pattern (17, 29). The visual pattern is either provided in the optical portion of a visual system or is formed on the surface of the substrate to be analyzed. A liquid droplet (26, 27) is dispensed onto the substrate surface, and the extent of the spread area of the droplet is compared to the visual pattern. If the area of the droplet is greater than or equal to a tolerance as signified by the pattern markings, then the surface of the substrate is determined to be sufficiently clean. In relying upon a simple visual comparison of the area of the surface covered by the droplet with an empirically determined visual pattern, a method for analyzing surface cleanliness is consistent between operators and surfaces, is easy to set up and operate, and improves manufacturing throughput.

REFERENCES:
patent: 3618374 (1971-11-01), Miller
patent: 3733893 (1973-05-01), Bickford et al.
patent: 4824230 (1989-04-01), Litt
patent: 5150608 (1992-09-01), Mazzoleni et al.
patent: 5275667 (1994-01-01), Ganesan et al.
G.S. Ganesan, et al.; "Contact Angles as a Measure of Interfacial Integrity: Theory and Experiments;" EEP, vol. 10-2, Advances in Electronic Packaging; pp. 717-722; ASME (1995).

Affiliated with

Also associated with

Rating

Method for determining the cleanliness of a surface does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for determining the cleanliness of a surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for determining the cleanliness of a surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1963190