Method for determining statistical fluctuations of values of...

Data processing: structural design – modeling – simulation – and em – Simulating electronic device or electrical system

Reexamination Certificate

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C703S014000, C716S030000

Reexamination Certificate

active

10272848

ABSTRACT:
Input parameters and technically possible parameter values associated therewith are selected, from which are obtained support point values and result values assigned thereto for the geometrical properties. At each support point value, the respective result value is assigned to the parameter value assigned to the respective support point value. A response surface is adapted to the result values in a total range of the assigned parameter values. This results in response values for which a minimum value and a maximum value are determined in subranges. A total interval is formed from the largest response value overall and the smallest response value overall. The total interval is divided into a given number of sub-intervals. For each of the sub-intervals, the individual probabilities are cumulated, which yields a total probability value for a respective sub-interval over all the value intervals.

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patent: 6381564 (2002-04-01), Davis et al.
Boning et. al., , May 1994, IEEE Transactions on Semiconductor Manufacturing, vol. 7, Issue 2, pp. 233-244 “DOE/Opt: A system for design of experiments, response surface modeling, and optimization using process and device simulation”.
IEEE 100 The Authoritative Dictionary of IEEE standards terms, seventh edition, 2000.
Charrier, E. W. et al.: “Yield Modeling and Enhancement for Optical Lithography”, SPIE, vol. 2440, pp. 435-447.

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