Method for determining rotational error portion of total...

Details Method for determining rotational error portion of total... Method for determining rotational error portion of total...

2005-09-27

2005-09-27

Smith, Zandra V. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With light detector

C356S401000

Reexamination Certificate

active

06950187

ABSTRACT:
A method for determining rotational error portion of total misalignment error in a stepper. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a first pattern and an error-free fine alignment target, in the stepper. In another step, the wafer is aligned in the stepper using the error-free fine alignment target. Then a second pattern is created on the wafer overlaying said first pattern. In another step, the rotational error portion of the total misalignment error is determined by measuring the circumferential misalignment between the first pattern and the second pattern.

REFERENCES:
patent: 5695897 (1997-12-01), Mitome et al.
patent: 6061119 (2000-05-01), Ota
patent: 6177680 (2001-01-01), Dick et al.

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