Method for determining parameters for lithographic...

Details Method for determining parameters for lithographic... Method for determining parameters for lithographic...

2006-04-11

2006-04-11

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C430S311000, C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07026082

ABSTRACT:
The method involves selecting features of a pattern to be imaged, notionally dividing the source into a plurality of source elements, for each source element, calculating the process window for each selected feature and then the OPC rules that optimize the overlap of the calculated process windows. Finally, those source elements are selected for which the overlapping of the process windows and the OPC rules satisfy specified criteria. The selected source elements define the source intensity distribution.

REFERENCES:
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patent: 6320648 (2001-11-01), Brueck et al.
patent: 6519760 (2003-02-01), Shi et al.
patent: 6871337 (2005-03-01), Socha
patent: 1 237 046 (2002-09-01), None
patent: 1 239 331 (2002-09-01), None

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