Method for determining optimal resist thickness

Details Method for determining optimal resist thickness Method for determining optimal resist thickness

2004-08-07

2009-02-17

Punnoose, Roy M (Department: 2886)

Optics: measuring and testing

By light interference

Having light beams of different frequencies

C356S503000, C356S630000

Reexamination Certificate

active

07492465

ABSTRACT:
In an example embodiment, there is a method (600) for determining an approximately optimal resist thickness comprising providing a first substrate coated with a resist film having a first thickness using a first coat program, (605, 610). The first thickness of resist is measured (615, 620). A second substrate is provided (625) and coated with a resist film using the first coat program. The resist film on the second substrate is exposed to radiation. The reflectance spectrum near the actinic wavelength of the resist film is measured (630). As a function of the periodicity of the reflectance spectrum, an effective refractive index is determined. Based on the effective refractive index, a periodicity of a swing curve of the resist film coated on the second substrate is determined (635). The maxima and minima are determined as a function of the periodicity.

REFERENCES:
patent: 5916717 (1999-06-01), Yang et al.
patent: 5960023 (1999-09-01), Takahashi
patent: 2002/0163649 (2002-11-01), Hirose et al.
Andre Schiltz, Concept of two-dimensional swing curves for critical dimension prediction and optimization of resist/antireflective coating bilayers in topographic situations, Mar. 2000, SPIE, Optical Engineering, pp. 776-786.

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