Method for determining optimal photolithography overlay...

Details Method for determining optimal photolithography overlay... Method for determining optimal photolithography overlay...

2007-04-03

2007-04-03

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S110000

Reexamination Certificate

active

09477201

ABSTRACT:
A method is provided for manufacturing, the method including processing a workpiece in a processing step, measuring a parameter characteristic of the processing performed on the workpiece in the processing step, and forming an output signal corresponding to the characteristic parameter measured. The method also includes setting a target value for the processing performed in the processing step based on the output signal.

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Chien et al., Modeling Overlay Errors and Sampling Strategies to Improve Yield, Journal of the Chinese Instittute of Industrial Engineers, vol. 18, No. 3, pp. 95-103.

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