Data processing: measuring – calibrating – or testing – Measurement system in a specific environment
Reexamination Certificate
2008-05-20
2008-05-20
Barlow, John (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
C430S005000
Reexamination Certificate
active
07376512
ABSTRACT:
The present invention relates to a method for determining an optimal absorber stack geometry of a lithographic reflection mask comprising a reflection layer and a patterned absorber stack provided on the reflection layer, the absorber stack having a buffer layer and an absorber layer. The method is based on simulating aerial images for different absorber stack geometries in order to determine process windows corresponding to the absorber stack geometries. The optimal absorber stack geometry is identified by the maximum process window size. The invention further relates to a method for fabricating a lithographic reflection mask and to a lithographic reflection mask.
REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5190836 (1993-03-01), Nakagawa et al.
patent: 5399448 (1995-03-01), Nagata et al.
patent: 6080606 (2000-06-01), Gleskova et al.
patent: 6635391 (2003-10-01), Stearns et al.
patent: 6773854 (2004-08-01), Ehrmann et al.
patent: 6835508 (2004-12-01), Butschke et al.
patent: 6841786 (2005-01-01), Kamm
patent: 10123768 (2002-12-01), None
Hirscher Stefan
Kamm Frank-Michael
Barlow John
Infineon - Technologies AG
Patterson & Sheridan L.L.P.
Taylor Victor J.
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