Fishing – trapping – and vermin destroying
Patent
1996-04-23
1997-07-29
Chaudhari, Chandra
Fishing, trapping, and vermin destroying
437 24, H01L 2166
Patent
active
056521510
ABSTRACT:
Impurity concentration profile is determined for a diffused layer of a semiconductor substrate by repeating a combination of etching of the diffused layer and measuring sheet resistance and/or hall resistance by using electrodes formed on the diffused layer. The etching of the diffused layer by a small amount is repeated in first portions aligned in the depth direction of the diffused layer, followed by etching of adjacent second portions aligned in the depth direction. The etching may be replaced by implanting inactive ions into portions of the diffused layer to generate high resistance for the portions.
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"Resistivity of Bulk Silicon and of Diffused Layers in Silicon," John C. Irvin, The Bell System Technical Journal, vol. XLI, No. 2, Mar. 1962, pp. 387-411.
Chaudhari Chandra
NEC Corporation
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