Method for determining absolute plasma parameters

Electricity: measuring and testing – Using ionization effects – For analysis of gas – vapor – or particles of matter

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73 3004, 31511121, 436153, G01N 2770, H05H 146

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active

057059314

ABSTRACT:
In accordance with the method of the present invention, the radio frequency discharge current generated in a plasma reactor is measured in the form of analog signals at a portion of the reactor acting as an earth electrode. The analog signals are converted into digital signals, and plasma parameters are evaluated from the digital signals by means of a mathematical algorithm.

REFERENCES:
patent: 5053343 (1991-10-01), Vora et al.
patent: 5175472 (1992-12-01), Johnson, Jr. et al.
patent: 5471115 (1995-11-01), Hikosaka
patent: 5565737 (1996-10-01), Keane
patent: 5572137 (1996-11-01), Jones
patent: 5576629 (1996-11-01), Turner et al.
R.J. Seebock, R. Deutsch and E. Rauchle; "Electric current oscillations in a parallel-plate plasma reactor"; J.Vac.Sci.Technol.All(3), May/Jun. 1993, pp. 682-688.
Russ A. Morgan; "Plasma Etching in Semiconductor Fabrication"; 1985 (month unavailable); pp. 202-221.
J.D. Johnson and A.J.T. Holmes; "Edge effect correction for small planar Langmuir probes"; Rev.Sci.Instrum. 61(10) Oct. 1990; pp.2628-2631.
K. Kobayashi, N. Mutsukura and Y. Machi; "Electrical measurements in a 13.56 MHz radio frequency discharge"; Vacuum, vol. 42, No. 12, 1991 (month unavailable); pp. 741-744.
V.A. Godyak and O.A. Popov; Experimental study of resonant rf discharges; Sov.J. Plasma Phys. 5(2), Mar.-Apr. 1979; pp. 227-231.
R.S. Harp and F.W. Crawford; "Characteristics of the Plasma Resonance Probe"; J. Appl. Phys., vol. 35, No. 12, Dec. 1964; pp. 3436-3446.
V.A. Godyak and R.B. Piejak; "Probe measurements of the space potential in a radio frequency discharge"; J. Appl.Phys. 68 (7), 1 Oct. 1990; pp. 3157-3162.
V.A. Godyak, R.B. Piejak and B.M. Alexandrovich; "Electrical Characteristics of Parallel-Plate RF Discharges in Argon"; IEEE Transactions on Plasma Science, vol. 19, No. 4, Aug. 1991; pp. 660-676.

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