Method for detecting process sensitivity to integrated circuit l

Details Method for detecting process sensitivity to integrated circuit l Method for detecting process sensitivity to integrated circuit l

1998-09-16

2000-10-31

Bowers, Charles

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

438800, H01L 2100

Patent

active

061401404

ABSTRACT:
A method and apparatus that uses compound processing for detecting defects in integrated circuits involves processing two portions of a semiconductor wafer differently according to a first and a second process. The first process and the second process are performed on alternating columns on the wafer. Image subtraction is used to detect differences between the layouts in adjacent columns. After differences are detected, the layout is examined to determine whether the difference represents a defect. If so, the design rules of the layout can be changed to accommodate a wider process variation.

REFERENCES:
patent: 6040912 (1998-09-01), Zika et al.

Affiliated with

Also associated with

Rating

Method for detecting process sensitivity to integrated circuit l does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for detecting process sensitivity to integrated circuit l, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for detecting process sensitivity to integrated circuit l will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2050263