Method for detecting phase error of a phase shift mask

Details Method for detecting phase error of a phase shift mask Method for detecting phase error of a phase shift mask

1996-10-03

1998-10-06

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058174370

ABSTRACT:
A method for detecting the phase error of a phase shift mask simply and with ease is disclosed and comprises the steps of: arranging a plurality of phase shift patterns, each having a predetermined width and serving to shift the light transmitted through predetermined regions of a transparent substrate of the phase shift mask, at a regular space on the transparent substrate; arranging a pattern for detecting phase error in which a light screen with a predetermined width is located between the predetermined regions of the transparent substrate and the phase shift mask; patterning a wafer by use of the phase shift mask and the patterns for detecting phase error; comparing the sizes by defocuses of the patterns in which phase is shifted with those of the patterns in which phase is not shifted; and utilizing the difference in the pattern size to detect the phase error.

REFERENCES:
patent: 5382484 (1995-01-01), Hosono
patent: 5439767 (1995-08-01), Yamashita et al.
patent: 5536603 (1996-07-01), Tsuchiya et al.

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