Method for detecting flare noise of semiconductor device

Details Method for detecting flare noise of semiconductor device Method for detecting flare noise of semiconductor device

2005-08-02

2005-08-02

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Methods

C355S053000, C430S005000

Reexamination Certificate

active

06924886

ABSTRACT:
A method for instantaneously detecting flare noise within patterns of the semiconductor device, which includes the steps of preparing a mask having a plurality of exposed areas having different light energy levels when being photo exposed and providing a plurality of dummy patterns with different sizes for detecting flare noises in each exposed area; forming dummy patterns on a wafer through a photolithography process with the mask; and detecting the flare noise by comparing the dummy patterns in each exposed area with an optical microscope.

REFERENCES:
patent: 2003/0068565 (2003-04-01), Ki et al.
patent: 2003/0197865 (2003-10-01), Shiode

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