Method for detecting endpoint of development

Details Method for detecting endpoint of development Method for detecting endpoint of development

1985-07-08

1986-11-04

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, 430325, 430326, 430331, 430966, 430967, 156626, 156627, G03C 524, B60S 152

Patent

active

046210377

ABSTRACT:
A method for detecting an endpoint of development including the steps of; forming a resist layer on a conductive layer formed on a substrate; exposing the resist layer by using light, X-rays, or electron beams; forming one electrode by connecting a connector consisting of a first conductive material to the conductive layer through the exposed resist layer on the substrate; forming another electrode by dipping an assembly consisting of a second conductive material into a developing solution; and developing the exposed resist layer while monitoring the current flowing between two electrodes.

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