Optics: measuring and testing – By polarized light examination – With light attenuation
Patent
1982-02-17
1985-02-12
Rosenberger, R. A.
Optics: measuring and testing
By polarized light examination
With light attenuation
356358, G01B 1102
Patent
active
044987757
ABSTRACT:
A device for monitoring gap deviations in an optical printer comprises a mask having a plurality of closely-spaced differently-sized apertures. Actinic light passing through the aperture to a photoresist surface develops a pattern of diffraction-induced images in the photoresist surface. Each image is uniquely shaped according to its associated aperture size, gap dimension, light wavelength and photoresist characteristics. An indexing parameter (.DELTA..nu.) is used to relate the pattern of images developed to gapping or focusing deviations in the system. Either proximity or projection printers can be used.
REFERENCES:
patent: 3797939 (1974-03-01), Pryor
patent: 3994584 (1976-11-01), Pryor
patent: 4403860 (1983-09-01), Pryor
"Maintenance and Repair Instructions for Micralign Models 220 and 240", by Perkin-Elmer, Norwalk, Connecticut, pp. 5-13 to 5-21.
Hamilton et al., Basic Integrated Circuit Engineering, McGraw-Hill, .COPYRGT. 1975, pp. 16, 17, 20-23.
Kasdan et al., "Linewidth Measurement by Diffraction Pattern Analysis", SPIE, vol. 80, Developments in Semiconductor Microlithography, (1976), pp. 54-63.
Cohen Donald S.
Lazar Joseph D.
Morris Birgit E.
RCA Corporation
Rosenberger R. A.
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