Method for detecting defects which originate from chemical...

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement

Reexamination Certificate

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Details

C430S311000, C430S312000, C430S328000, C382S144000, C382S145000

Reexamination Certificate

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07862965

ABSTRACT:
A method for detecting defects which originate from a chemical solution includes coating a chemical solution on a surface of a mask, and radiating an exposure beam to the mask on which the chemical solution is coated, thereby performing enlarged projection exposure on a resist film which is formed on a surface of a substrate for an inspection. Further, the method for detecting defects which originate from a chemical solution includes performing an inspection of defects on the resist film which has been subjected to the enlarged projection exposure, and determining whether a result of the inspection meets a predetermined standard.

REFERENCES:
patent: 2004/0246479 (2004-12-01), Cartlidge et al.
patent: 2005-300421 (2005-10-01), None

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