Method for detecting defects which originate from chemical...

Details Method for detecting defects which originate from chemical... Method for detecting defects which originate from chemical...

2011-01-04

2011-01-04

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S311000, C430S312000, C430S328000, C382S144000, C382S145000

Reexamination Certificate

active

07862965

ABSTRACT:
A method for detecting defects which originate from a chemical solution includes coating a chemical solution on a surface of a mask, and radiating an exposure beam to the mask on which the chemical solution is coated, thereby performing enlarged projection exposure on a resist film which is formed on a surface of a substrate for an inspection. Further, the method for detecting defects which originate from a chemical solution includes performing an inspection of defects on the resist film which has been subjected to the enlarged projection exposure, and determining whether a result of the inspection meets a predetermined standard.

REFERENCES:
patent: 2004/0246479 (2004-12-01), Cartlidge et al.
patent: 2005-300421 (2005-10-01), None

Affiliated with

Also associated with

Rating

Method for detecting defects which originate from chemical... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for detecting defects which originate from chemical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for detecting defects which originate from chemical... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2737123