Method for detecting defects that exhibit repetitive patterns

Details Method for detecting defects that exhibit repetitive patterns Method for detecting defects that exhibit repetitive patterns

2006-08-22

2006-08-22

Deb, Anjan (Department: 2858)

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

For fault location

C324S719000, C324S765010

Reexamination Certificate

active

07095239

ABSTRACT:
A method for detecting defects in devices that are fabricated in repetitive patterns upon the surface of a substrate by the, repetitive utilization of masks and similar devices. A mask flaw will become manifest in a series of defective devices as the mask is successively utilized. The detection of repetitive defects is undertaken by determining the electrical resistance of devices in a group, such as a column, fabricated upon the wafer surface, where the repetitive defect will occur multiple times. The mean electrical resistance of the group is determined and a percent deviation of each device from the mean is then determined. The percent deviation of all of the devices in the group are multiplied together to create a multiplied percent deviation number and the multiplied percent deviation number is then compared with a figure of merit value to make a determination of whether defective devices exist within the group.

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patent: 6268093 (2001-07-01), Kenan et al.
patent: 2004/0057610 (2004-03-01), Filseth et al.

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