Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-03-22
2005-03-22
Mehta, Bhavesh M. (Department: 2625)
Image analysis
Applications
Manufacturing or product inspection
C356S237100
Reexamination Certificate
active
06870950
ABSTRACT:
The present invention provides a method for detecting defects in a material and a system for accomplishing the same. The method includes obtaining an image of at least a portion of a material's surface and converting the image into an intensity profile. The method further includes determining a defect in the material's surface from the intensity profile. In one exemplary embodiment, the image is an electron image obtained using a scanning electron microscope. The method may further be used to determine a defect density in the material's surface.
REFERENCES:
patent: 5406213 (1995-04-01), Henley
patent: 5808735 (1998-09-01), Lee et al.
patent: 5867597 (1999-02-01), Peairs et al.
patent: 6366688 (2002-04-01), Jun et al.
patent: 6535621 (2003-03-01), Fujita
Antonell Mike
Cavanagh Pam
Houge Erik C.
Ma Hui
Vartuli Catherine
Agere Systems Inc.
Mehta Bhavesh M.
Strege John
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