Radiant energy – Means to align or position an object relative to a source or...
Reexamination Certificate
2006-08-08
2006-08-08
Nguyen, Kiet T. (Department: 2881)
Radiant energy
Means to align or position an object relative to a source or...
C250S492200
Reexamination Certificate
active
07087910
ABSTRACT:
A method for detecting and compensating for positional displacements of a photolithographic mask unit, includes providing mask production data for the writing of the mask unit with an electron beam. A structure density of the mask unit is input and an electron beam deflection is brought about on the mask unit in dependence on the determined structure density of the mask unit. The mask production data are corrected through the use of the determined electron beam deflection, in order to obtain corrected mask production data, and the corrected mask production data are output. A lithography apparatus for mask units with correction of positional displacements of the mask unit, is also provided.
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Denise Puisto et al.: “Overlay enhancement with product-specific emulation in electron-beam lithography tools”,J. Vac. Sci. Technol.,vol. B 12(6), Nov./Dec. 1994, pp. 3436-3439.
Min Bai et al.: “Transient measurement of resist charging during electron beam exposure”,J. Vac, Sci. Tchnol.,vol. B 21(1), Jan./Feb. 2003, pp. 106-111.
Lutz Tarek
Schneider Jens
Greenberg Laurence A.
Infineon - Technologies AG
Locher Ralph E.
Nguyen Kiet T.
Stemer Werner H.
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