Method for detecting an IC defect using charged particle beam

Details Method for detecting an IC defect using charged particle beam Method for detecting an IC defect using charged particle beam

1996-04-30

1997-01-07

Nguyen, Vinh P.

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

Of individual circuit component or element

324750, G01R 3128

Patent

active

055921000

ABSTRACT:
Test patterns are applied to an IC under test under a test pattern address by which the first fail is caused and under other test pattern addresses. A defect candidate area is moved to the position where a charged particle beam can scan the area and defect candidate wiring portions are specified. A potential data of the specified wiring is acquired for each of the test patterns and stored in a memory. This process is performed by sequentially stepping back the stop test pattern addresses. Then, a potential data of the specified wiring in the specified area is similarly acquired for non-defect IC. The respective potential data of the IC under test and the non-defect IC are compared to locate the mismatch test pattern address and wiring.

REFERENCES:
patent: 4358732 (1982-11-01), Johnston et al.
patent: 4864228 (1989-09-01), Richardson
patent: 4870344 (1989-09-01), Stille
patent: 5164666 (1992-11-01), Wolfwang et al.
patent: 5210487 (1993-05-01), Takahashi et al.
patent: 5391985 (1995-02-01), Henley

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