Method for detecting a location of contaminant entry in a proces

Chemistry: analytical and immunological testing – Metal or metal containing – Oxide or gas content of metal

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436 73, 436 77, 436 79, 436 80, 436 81, 436 82, 436 83, 436 84, 436149, 436155, 436164, 436172, 436173, 436182, G01N 3320

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06037182&

ABSTRACT:
A method is used to detect a location of contaminant entry in a processing fluid production and distribution system. A wafer is placed in a clean container. The clean container is connected to a test point within the processing fluid production and distribution system. Processing fluid from the test point of the processing fluid production and distribution system is allowed to flow through the clean container. The wafer is dried. The wafer is then tested for the existence of contaminants.

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