Method for designing reticle, reticle, and method for manufactur

Details Method for designing reticle, reticle, and method for manufactur Method for designing reticle, reticle, and method for manufactur

1995-10-20

2000-08-08

Smith, Lynette R. F.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

B44C 122, C23F 100

Patent

active

060999926

ABSTRACT:
A reticle is designed with a method including a step of generating first dummy patterns with intervals from main patterns. Each of the first dummy patterns are divided into a plurality of spaced apart second dummy patterns and then each of the second dummy patterns are measured to find third dummy patterns having widths and areas below smallest allowable values. The third dummy patterns are then respectively connected to second dummy patterns which are adjacent to the third dummy patters by generating a connecting dummy pattern. Selective non-connected third dummy patterns are removed. The first dummy patterns are divided into a plurality of second dummy patterns by vertical and horizontal strip lines crossing the first dummy patterns.

REFERENCES:
S. Mahajan, et al., "Concise Encyclopedia of Semiconductor Materials & Related Technologies", pp. 170-171, published by Pergamon Press., 1992.

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